Silicon nitride substrate


Silicon nitride thermal conductive substrates are widely used in the fields of LED, microelectronic welding and other fields, power transmitters, photovoltaic devices, IGBT modules, semiconductor packaging substrates, and other high-power optoelectronics and semiconductor devices.

 

The existing insulating layer mainly uses silicon nitride material. By making the insulating layer absorb this thermal expansion rate,  welding cracks can be solved and reduced, and heat dissipation can be improved.

 

ItemsSpecificationUnit
Size114×114×0.32
Surface roughness≤0.8Ra
Bulk density3.20 ± 0.05g/cm3
Modulus of elasticity300~320Gpa
Poisson's ratio≤0.29-
Vickers hardness≥14.2Gpa
Coefficient of thermal expansion
(25 ℃ ~ 500 ℃)
3.0~3.210-6/℃
Fracture toughness6.0~7.0MPa

Bending strength 

(three point bending)

700~800Mpa

Thermal conductivity 

(25 ℃)

≥85W/(m•k)