Fuleda Technology supplies 2"~12" high-quality thermal oxide silicon wafers. The high-quality, defect-free product-grade silicon wafers are used as the substrate to grow a highly uniform thermal oxide layer to meet the performance beyond customer expectations. After the conventional thermal oxidation process, the silicon wafer generally has an oxide layer on both sides; if only a single-sided oxide layer is required, the oxide layer on one side can be ground and only leave the single-sided oxide layer to supply.