Metal Film Wafer


Metal film silicon wafers are mainly used in ohmic contacts, conductive substrates, scanning electron microscopes, atomic force microscopes, and nanomaterials.


Fuleda Technology supplies services such as spot metal film silicon wafers and customized processing.



 ProcessMagnetron Sputtering、Evaporation、Electroplating
 Diameter 1″ / 2″ /  3″ /  4″ /  6″ inch
 Orientation110、110、111 etc
TypeN-Type、 P-Type、 Intrinsic
Resistivity

 CZ/MCZ:From 0.001 to 1000 ohm-cm

FZ:up to 20k ohm-cm

 Film Thickness

 10~1000nm

MetalAu、Pt、Al、Cu、Ni、Ag etc
 StructureSubstrate＋Ti、Cr、Ni＋Coating Film
 Other SubstrateQuarte / Lithium Niobate / Glass etc
















1631497050282095275.png